Industry

DISCO Corporation announces laser slicing technology for high-speed SiC wafer production

DISCO Corporation has announced it has developed an ingot laser slicing method called “KABRA” (Key Amorphous-Black Repetitive Absorption) for SiC wafer which enables high-speed wafer production with reduced material loss.

Compared with existing diamond wire saw process, the total processing time per ingot reduces from 2.5-3.5 days to 18 hours. Also, the number of wafers from one ingot increases from 30 wafers to 44 wafers when producing 350um wafers from 4-inch 20mm thick SiC ingot.

DISCO will present the process in The Japan Society for Precision Engineering Autumn Meeting / The Japan Society of Applied Physics Autumn Meeting in Sep 2016 and the equipment will be displayed at SEMICON Japan 2016 on 14-16 Dec 2016.

EEinews
EEinews
EEinews is an online magazine focusing on the electronics industry from an Eastern perspective. We aim to provide more insight on the development of the electronics industry in Japan, China and other countries from the east. You will find news, analysis as well as product reviews from this website.

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